Semiconductor surfaces need to as free from contaminants and defects as possible in order to work effectively. This study from Molecular Vista investigates the use of infrared-photo-induced force microscopy (IR PiFM) to examine sub-100nm defects, their contaminants and the effectiveness of the cleaning process. KnowItAll IR Spectral Library helped to identify the material in the defect, show how effective the removal of the bonding material was, and how effective the cleaning process was.
View Case StudyAnalyzing sub-100 nm particulate defects and ultrathin (~1 nm thick) residues in semiconductor processes
Technique: IR
Applications: Polymers & Materials Science
Products: KnowItAll IR Spectral Library, KnowItAll Software
