Atomic force microscopy-infrared spectroscopy (AFM-IR) is being evaluated as an in-line defect detector in the high-volume manufacturing sector, particularly for photomasks used in semiconductor manufacturing.

This study, conducted by Intel in collaboration with Bruker, study explores the integration of these two techniques in order to speed up the manufacturing process. KnowItAll software and KnowItAll IR spectral library were used in combination with Intel's own libraries to identify the resulting IR spectra.

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